I-HE 100µ
I-HE 100µ
ID: 17564
Technische Spezifikationen
Bitte loggen Sie sich für weitere Informationen ein...
I-HE was specially developed for the application "PowderBlasting" (micro-abrasive material removal by sandblasting) and for the processing of technical glasses and ceramics. The photolithographic blast film I-HE is hot laminated onto the substrate with a dry resist laminator and the exposure takes place as soon as the material has cooled down to room temperature. Unlike other photoresist materials, I-HE is not developed with alkaline solutions, but with water. Chemical additives are neither required for development, nor for stripping.
Fields of application of I-HE:
- Microperforation of thin glass (wafer) and technical ceramics
- MEMS packaging
- Lens packaging
- Production of Lab on Chip systems
- Engraving of identification numbers and company logos
- Targeted surface structuring of metal.
I-HE is available
in rolls
in material thickness 100µ.